POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS

Abstract: a polymer is defined as comprising repeat units having a cyclic acetal structure fused to an aromatic ring and repeat units derived from an onium salt compound containing a fluorosulfonic acid anion having a polymerizable group and an iodized aromatic ring structure. a chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., el, lwr, cdu and dof, collapse resistance during fine pattern formation, and etch resistance after development.

Inventor(s): Masahiro Fukushima, Jun Hatakeyama, Masaki Ohashi, Tatsuya Yamahira

CPC Classification: G03F7/0397 (Macromolecular compounds which are photodegradable, e.g. positive electron resists ( takes precedence; macromolecular quinonediazides ))

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