POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

Abstract: a positive resist composition is provided comprising a polymer comprising an aromatic hydroxy acid having a carboxy group and a phenolic hydroxy group which are both substituted with an acid labile group having an aromatic group-containing cyclic acetal structure. it exhibits a high sensitivity and resolution and forms a pattern of satisfactory profile with reduced lwr or improved cdu.

Inventor(s): Jun Hatakeyama, Masahiro Fukushima

CPC Classification: G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable ( takes precedence; macromolecular azides ; macromolecular diazonium compounds ))

Search for rejections for patent application number 20250172870