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20250170623. Vacuum Processin (Hitachi High-Tech)

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Vacuum Processing Device and Foreign Matter Ejection Method

Abstract: the present invention reduces the foreign matter that has stuck to the inner wall of a vacuum sample chamber or a load lock chamber a vacuum processing device comprises a conveyance robot the vacuum sample chamber the load lock chamber a neutralization device for neutralizing the foreign matter having stuck to the inner wall of the load lock chamber and/or the vacuum sample chamber a valve for dry nitrogen introduction to supply nitrogen to the load lock chamber and the vacuum sample chamber pumps and for exhausting the load lock chamber and the vacuum sample chamber and a control device the control device controls the conveyance robot the neutralization device the pumps and and the valve for dry nitrogen introduction, thereby neutralizing the foreign matter having stuck to the inner wall of the load lock chamber and/or the vacuum sample chamber as well as performing air exhaustion of and nitrogen supply to the load lock chamber and the vacuum sample chamber

Inventor(s): Taiki KOBAYASHI, Seiichiro KANNO, Go MIYA, Yuuta YANBE

CPC Classification: B08B9/00 (Cleaning hollow articles by methods or apparatus specially adapted thereto  ( takes precedence))

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