20250167027. Closed Loop Control Sy (Applied Materials, .)
CLOSED LOOP CONTROL SYSTEM TO MONITOR INSIDE PARAMETERS OF A SUBSTRATE CARRIER
Abstract: a method for monitoring inside parameters of a substrate carrier. the method includes receiving a first substrate carrier, supplying a fluid, at a first flow rate, through an inlet of the first substrate carrier, and at least partially purging the fluid through an outlet of the first substrate carrier for a first period of time. the method further includes measuring, using a first sensor disposed at the outlet, a first value of a first property of an exhaust from the substrate carrier at the outlet of the first substrate carrier, and determining, based at least in part on the first value of the first property, a second value of the first property inside the first substrate carrier.
Inventor(s): Srinivas Poshatrahalli Gopalakrishna, Shivaraj Nara Manjunath, Devendra Channappa Holeyannavar, Paul Reuter, Douglas Baumgarten, Sushant Koshti, Amit Kumar Biswas, Nithiyanantham Balasubramaniam, Latha Ramesh, Navya Talluri
CPC Classification: H01L21/67389 (using specially adapted carriers {or holders; Fixing the workpieces on such carriers or holders (holders for supporting a complete device in operation )})
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- Patent Applications
- Applied Materials, Inc.
- CPC H01L21/67389
- Srinivas Poshatrahalli Gopalakrishna of Bangalore IN
- Shivaraj Nara Manjunath of Bangalore IN
- Devendra Channappa Holeyannavar of Bangalore IN
- Paul Reuter of Austin TX US
- Douglas Baumgarten of Round Rock TX US
- Sushant Koshti of Sunnyvale CA US
- Amit Kumar Biswas of Bangalore IN
- Nithiyanantham Balasubramaniam of Leander TX US
- Latha Ramesh of Bangalore IN
- Navya Talluri of Bangalore IN