DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM

Abstract: an ion implantation system includes a sensor for monitoring depositions of particles or flakes of other materials. the sensor monitors film thickness on a clear panel from behind the clear panel by emitting light and detecting reflections from the light. the system generates an alert for a buildup thickness. the composition of the film may also be detected by the sensor.

Inventor(s): Phillip Geissbuhler, Neil Bassom, David Hoglund, Vladimir Romanov

CPC Classification: H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se , , ; simple temporary support means, e.g. using adhesives, electric or magnetic means , ; apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto ;)})

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