PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Abstract: provided is a technique for grasping the state of plasma processing. a plasma processing method is a method for generating plasma in a chamber to executing plasma processing on a substrate in a plasma processing apparatus having the chamber and a substrate support disposed in the chamber, the method including (a) placing the substrate on the substrate support, (b) generating plasma in the chamber to execute the plasma processing on the substrate on the substrate support, (c) acquiring data related to ion flux generated between the plasma generated in the chamber and the substrate placed on the substrate support in the (b), and (d) detecting an end point of the plasma processing based on the data.

Inventor(s): Yusuke SHIMIZU, Satoru NAKAMURA, Toshihisa OZU, Naoki MATSUMOTO

CPC Classification: H01J37/32963 (Gas-filled discharge tubes (heating by discharge ))

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