METHOD AND SYSTEM FOR PLASMA PROCESS

Abstract: an example method for a plasma process includes generating plasma within a process chamber with source power (sp) pulses. the source power pulses have a repetition frequency. the method further includes adjusting a neutral flux within the process chamber by changing the repetition frequency of the source power pulses. in some embodiments, the plasma etches a substrate.

Inventor(s): Evrim Solmaz, Du Zhang, Barton Lane

CPC Classification: H01J37/32366 (Gas-filled discharge tubes (heating by discharge ))

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