PLASMA PROCESSING WITH PHASE-LOCKED WAVEFORMS

Abstract: a plasma processing method includes applying ac waveforms to a bottom electrode in a plasma chamber to generate a plasma. the method further includes applying a first pulse train including a first plurality of dc pulses to a top electrode in the plasma chamber, where each dc pulse of the first plurality of dc pulses includes a first on-state and a first off-state. and the method further includes applying a second pulse train including a second plurality of dc pulses to the bottom electrode in the plasma chamber, and where each dc pulse of the second plurality of dc pulses includes a second on-state and a second off-state, the first pulse train being offset in phase relative to the second pulse train so that each first off-state overlaps with each second on-state.

Inventor(s): Pingshan Luan, Minjoon Park

CPC Classification: H01J37/32146 (Gas-filled discharge tubes (heating by discharge ))

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