METHOD OF FORMING A PLANARIZATION LAYER INCLUDING EXPOSING AT DIFFERENT TEMPERATURES A PHOTOCURABLE COMPOSITION TO ACTINIC RADIATION

Abstract: a system can include a first radiation exposure station including a first actinic radiation source, a superstrate removal tool, a second radiation exposure station located remotely with respect to the first radiation exposure station, and a controller. the second radiation exposure station can include a second actinic radiation source and a heating means for heating a photocurable composition. the controller can be configured to activate the superstrate removal tool to remove the superstrate after a first radiation exposure within the first radiation exposure station and before a second radiation exposure within the second radiation exposure station, and control the heating means to heat the photocurable composition to the radiation exposure temperature. the system can perform a method that includes radiation exposure at a first temperature and radiation exposure at a second temperature that is greater than an ambient temperature and different from the first temperature.

Inventor(s): Timothy Brian STACHOWIAK, Weijun Liu

CPC Classification: G03F7/70558 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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