METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING MASK, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT

Abstract: a method of correcting a registration error of a mask includes: performing a test exposure using an exposure apparatus; extracting registration error data according to a dose difference of beams in a preset process condition, through the test exposure; providing a dose map for a pattern area of the mask; and generating a correction map using the dose map and the registration error data.

Inventor(s): Sunghoon Park, Junesik Hwang

CPC Classification: G03F7/70516 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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