Reflective Surface for a Photochemistry Chamber

Abstract: a surface covering or film for reflecting uvc or nir radiation can be applied as a covering on a wall of a chamber includes a substrate with a smooth front surface overlain by a stack of parallel dielectric bilayers of different refractive index so that the stack forms a reflective layer at a selected range of wavelengths. the film can include an integral radiation source. a thermal insulation layer can be included to reduce conductive energy loss. the film can include decorative features at visible wavelengths that minimally affect the reflectivity of the stack at uvc or nir wavelengths. a control device functions to activate or inactivate radiation sources, to apply voltages to selected regions of a reflective film or array of reflective films, and/or to receive and process sensor inputs. the stack is underlain by regions of electrically conductive material at different voltages. the film can be formed into individual tiles applied edge to edge.

Inventor(s): David Prystupa, John Pacak

CPC Classification: G02B5/0891 (Mirrors {(vehicle mirrors involving special optical features )})

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