OPTICAL METROLOGY

Abstract: a method for monitoring a plurality of process chambers, the method includes generating an optical beam at a light source. the method further includes dividing the optical beam into a plurality of light beams. the method further includes providing the plurality of light beams to the plurality of process chambers. and the method further includes measuring the plurality of light beams after being reflected within the plurality of process chambers.

Inventor(s): Holger Tuitje, Xinkang Tian, Ching Ling Meng

CPC Classification: G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step )})

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