SYSTEMS AND METHODS FOR ANALYSING THE SURFACE QUALITY OF A SUBSTRATE WITH PARALLEL FACES

Abstract: a method for analyzing the surface quality of a substrate may include emitting a first light beam incident on a first face of said substrate, receiving a first reflected beam resulting from the reflection of the first beam by the first face and a second reflected beam resulting from a reflection by a second face of the substrate in order to generate at least a first measurement signal characteristic of a combination of the wavefronts of the first and second reflected beams, receiving a transmission beam resulting from transmission of the substrate by a second light beam in order to generate a second measurement signal, and calculating, from the first and second measurement signals, a first signal and a second signal representative of a deformation of the first face and the second face respectively.

Inventor(s): Xavier Levecq, Nicolas Lefaudeux

CPC Classification: G01B11/303 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS)

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