SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Abstract: the present disclosure provides a substrate processing apparatus and a substrate processing method, which control an internal temperature of a process tube in a substrate processing process. the substrate processing apparatus includes a process tube configured to provide a process apace in which a processing process for a plurality of substrates laminated in multiple stages is performed, a heater provided outside the process tube to heat the process tube, an internal temperature measuring part provided inside the process tube to measure an internal temperature of the process tube, an external temperature measuring part provided at least partially between the process tube and the heater to measure an external temperature of the process tube, and a controller configured to control an output of the heater by utilizing the internal temperature of the process tube, which is measured in the internal temperature measuring part, and the external temperature of the process tube, which is measured in the external temperature measuring part. the controller includes a preliminary output value operation part configured to operate a preliminary output value of the heater by utilizing the measured internal temperature of the process tube, and a correction determination part configured to determine whether the preliminary output value of the heater is corrected based on the measured external temperature of the process tube.

Inventor(s): Hyo Jin SUN

CPC Classification: C23C16/52 (Controlling or regulating the coating process {(, take precedence)})

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