A SUBSTRATE PROCESSING APPARATUS AND A METHOD

Abstract: a substrate processing apparatus (), comprising a reaction chamber () for processing at least one substrate, and a deformable in-feed assembly () comprising an upper () and a lower () portion movable with respect to each other, the deformable in-feed assembly () being configured to deform between a vertically extended state facilitating a reactant flow towards the reaction chamber (), and a vertically retracted state allowing substrate loading, and a resilient tubular conduit () coupled to the upper portion () of the deformable in-feed assembly ().

Inventor(s): Antti KUITUNEN, Tom BLOMBERG, Jani KIVIOJA, Juho POUTIAINEN, Heikki ALAKOSKI

CPC Classification: C23C16/45587 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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