CARBON CONTAINING PRECURSORS FOR BEAM-INDUCED DEPOSITION

Abstract: systems, components, and methods for beam-induced deposition are described. a charged particle beam system can include a vacuum chamber. the system can include a charged particle beam source, operably coupled with the vacuum chamber and including an emitter section and a column section, the charged particle beam source being configured to generate a beam of charged particles and to direct the beam of charged particles into the vacuum chamber. the system can include a precursor source, operably coupled with the vacuum chamber and configured to direct a gas stream comprising a precursor into the vacuum chamber. the precursor can include a hydrocarbon having a vapor pressure greater than about 1.6�10−4 mbar at about 293 k and about 101.3 kpa, and wherein the hydrocarbon is not naphthalene.

Inventor(s): Gavin MITCHSON, Chad RUE

CPC Classification: C23C16/047 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))

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