VACUUM CHUCK FOR HIGH WARPAGE WAFERS

Abstract: a vacuum chuck for supporting a sample, the vacuum chuck comprising: a support plate having an upper planar support surface sized and shaped to retain a sample disposed thereon; one or more vacuum lines formed within the support plate; a plurality of cavities formed within the support plate, wherein each cavity is fluidly coupled to a vacuum line in the one or more vacuum lines and includes an aperture at an upper surface of the planar support surface; and a plurality of vacuum pad plungers corresponding in number to the plurality of cavities, wherein each vacuum pad plunger is disposed in a unique one of the cavities and comprises a plunger body having a vacuum channel extending through its length and a biasing mechanism, wherein the plunger body is moveable between an up position in which a portion of the plunger body extends through the aperture of its respective cavity protruding above the upper planar support surface and a down position in which the plunger body is retracted into the cavity, and wherein the biasing mechanism biases the plunger body in the up position.

Inventor(s): Hagay Cafri

CPC Classification: B23Q3/088 (DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING (tools of the kind used in lathes or boring machines ); MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT)

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