19014787. PLASMA PROCESSING APPARATUS (HITACHI HIGH-TECH CORPORATION)
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
PLASMA PROCESSING APPARATUS
This abstract first appeared for US patent application 19014787 titled 'PLASMA PROCESSING APPARATUS
Original Abstract Submitted
A plasma processing for, including a processing chamber; a base plate formed with an exhaust an exhaust portion lid disposed in the processing chamber so as to face the exhaust opening; an exhaust device configured to exhaust a gas in the processing chamber via the exhaust opening; and an actuator configured to drive the exhaust portion lid. The exhaust portion lid includes a circular plate portion and a protruding portion protruding from the circular plate portion toward the exhaust opening. The exhaust portion lid is driven by the actuator to one of a first position where the protruding portion and the exhaust opening are separated from each other in a direction of the movement, a second position where a position of the protruding portion in the direction of the movement overlaps that of the exhaust opening, and a third position where the circular plate portion abuts on the base plate.
