19012582. LOCAL DENSITY CONTROL FOR METAL CAPACITANCE REDUCTION (Intel Corporation)
LOCAL DENSITY CONTROL FOR METAL CAPACITANCE REDUCTION
Organization Name
Inventor(s)
Burak Baylav of Hillsboro OR US
Dhananjay Bhawe of Hillsboro OR US
LOCAL DENSITY CONTROL FOR METAL CAPACITANCE REDUCTION
This abstract first appeared for US patent application 19012582 titled 'LOCAL DENSITY CONTROL FOR METAL CAPACITANCE REDUCTION
Original Abstract Submitted
An integrated circuit structure includes a plurality of interconnect lines and a plurality of dummy lines that are co-planar with the plurality of interconnect lines, where a ratio of line length to end-to-end spacing of the dummy lines varies inversely with a density of the interconnect lines within each of a plurality of regions. The regions are of approximately equal area within a rectangular grid array.