19003264. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Daisuke Yoshikoshi of Miyagi JP
Kunihiko Yamagata of Miyagi JP
PLASMA PROCESSING APPARATUS
This abstract first appeared for US patent application 19003264 titled 'PLASMA PROCESSING APPARATUS
Original Abstract Submitted
A plasma processing apparatus comprises a plasma processing chamber, a substrate support, a high frequency power supply, an electrode or an antenna, a power consuming member, an electricity storage unit, a power transmitting coil, a power receiving coil and at least one driving system. The power transmitting coil is provided outside the plasma processing chamber. The power receiving coil is electrically connected to the electricity storage unit and capable of receiving power from the power transmitting coil by electromagnetic induction coupling. The at least one driving system is configured to change a distance between the power transmitting coil and the power receiving coil by moving at least one of the power transmitting coil and the power receiving coil.
