19003142. PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING POWER STORAGE AMOUNT (Tokyo Electron Limited)
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING POWER STORAGE AMOUNT
Organization Name
Inventor(s)
Daisuke Yoshikoshi of Miyagi JP
Kunihiko Yamagata of Miyagi JP
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING POWER STORAGE AMOUNT
This abstract first appeared for US patent application 19003142 titled 'PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING POWER STORAGE AMOUNT
Original Abstract Submitted
A plasma processing apparatus comprises a plasma processing chamber, a substrate support, a high frequency power supply, an electrode or an antenna, a power consuming member, a ground frame, an electricity storage unit, a rectifying and smoothing unit, a power feeding output connector, and a power receiving coil. The rectifying and smoothing unit includes a power feeding input connector comprising a first power feeding input terminal and a second power feeding input terminal, and a rectifying circuit comprising a diode bridge. The power feeding output connector comprises a first feeding output terminal and a second power feeding output terminal which are electrically connectable to the first power feeding input terminal and the second power feeding input terminal. The power receiving coil is electrically connected to the power feeding output connector, and capable of receiving power from a power transmitting coil by electromagnetic induction coupling.