19002994. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Daisuke Yoshikoshi of Miyagi JP
Kunihiko Yamagata of Miyagi JP
PLASMA PROCESSING APPARATUS
This abstract first appeared for US patent application 19002994 titled 'PLASMA PROCESSING APPARATUS
Original Abstract Submitted
Provided is a plasma processing apparatus comprising: a plasma processing chamber; a substrate support; a high frequency power supply; an electrode or an antenna electrically connected to the high frequency power supply; a power consuming member disposed within the plasma processing chamber or the substrate support; an electricity storage unit electrically connected to the power consuming member; a power transmitting coil provided outside the plasma processing chamber; a power receiving coil electrically connected to the electricity storage unit and capable of receiving power from the power transmitting coil; at least one metal case that provides a shielded space and accommodates the power transmitting coil and the power receiving coil within the shielded space; and at least one ferrite material that is disposed within the shielded space and is provided to close a space in which the power transmitting coil and the power receiving coil are disposed.