19001619. METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH FUSE STRUCTURE (NANYA TECHNOLOGY CORPORATION)
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH FUSE STRUCTURE
Organization Name
Inventor(s)
HSIH-YANG Chiu of TAOYUAN CITY TW
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH FUSE STRUCTURE
This abstract first appeared for US patent application 19001619 titled 'METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH FUSE STRUCTURE
Original Abstract Submitted
A method for fabricating a semiconductor device is provided. The method includes providing a substrate; forming a fuse element within the substrate and extending from an upper surface of the substrate; and forming a fuse medium in contact with the fuse element, wherein the fuse medium is spaced apart from the upper surface of the substrate.