18977548. DESCENDING ETCHING RESISTANCE IN ADVANCED SUBSTRATE PATTERNING (Applied Materials, Inc.)
DESCENDING ETCHING RESISTANCE IN ADVANCED SUBSTRATE PATTERNING
Organization Name
Inventor(s)
Chung-Chia Chen of Hsinchu City TW
Ji Young Choung of Hwaseong-si KR
Dieter Haas of Santa Clara CA US
Jungmin Lee of Santa Clara CA US
Si Kyoung Kim of Gwangju-si KR
DESCENDING ETCHING RESISTANCE IN ADVANCED SUBSTRATE PATTERNING
This abstract first appeared for US patent application 18977548 titled 'DESCENDING ETCHING RESISTANCE IN ADVANCED SUBSTRATE PATTERNING
Original Abstract Submitted
Sub-pixel circuits and methods of forming sub-pixel circuits that may be utilized in a display such as an organic light-emitting diode (OLED) display. In one example, a device includes a substrate, pixel-defining layer (PDL) structures disposed over the substrate and defining sub-pixels of the device, and a plurality of overhang structures. The first sub-pixel includes a first anode, OLED material, a first cathode, and a first encapsulation layer having a gap defined by a first portion of the first encapsulation layer disposed over the first cathode, a second portion of the first encapsulation layer disposed over a sidewall of the body structure, and a third portion of the first encapsulation layer under an underside surface of the top extension of the top structure, the first portion of the first encapsulation layer contacting the third portion of the first encapsulation layer.