18975131. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Taro Ikeda of Nirasaki City JP
Toshifumi Kitahara of Fuchu City JP
PLASMA PROCESSING APPARATUS
This abstract first appeared for US patent application 18975131 titled 'PLASMA PROCESSING APPARATUS
Original Abstract Submitted
A plasma processing apparatus includes a chamber and a waveguide portion. The waveguide portion is configured to propagate electromagnetic waves to generate plasma within the chamber. The waveguide portion includes a resonator configured to resonate the electromagnetic waves therein. The resonator includes a microstrip and a dielectric member. A part of the dielectric member constitutes a dielectric layer of the microstrip.
