18967551. Plasma Processing Apparatus and Method for Measuring Resonance Frequency (Tokyo Electron Limited)
Plasma Processing Apparatus and Method for Measuring Resonance Frequency
Organization Name
Inventor(s)
Kazushi Kaneko of Yamanashi JP
Plasma Processing Apparatus and Method for Measuring Resonance Frequency
This abstract first appeared for US patent application 18967551 titled 'Plasma Processing Apparatus and Method for Measuring Resonance Frequency
Original Abstract Submitted
A plasma processing apparatus comprising: a processing chamber; an electromagnetic wave generator; a resonating structure formed by arranging resonators that are capable of resonating with a magnetic field component of electromagnetic waves; a measurement part configured to measure, for each frequency, a power of the electromagnetic waves traveling from the electromagnetic wave generator to the resonating structure and a power of transmitted waves, reflected waves, or scattered waves of the electromagnetic waves in the resonating structure; and a controller that performs measuring the power of the electromagnetic waves and the power of the transmitted waves, the reflected waves, or the scattered waves with the measurement part, and calculating a resonance frequency of the resonating structure based on frequency distribution of characteristic values of the resonating structure, calculated from the power of the electromagnetic waves and the power of the transmitted waves, the reflected waves, or the scattered waves.
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