18958534. SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD (Tokyo Electron Limited)
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
Organization Name
Inventor(s)
Kouzou Kanagawa of Koshi City (JP)
Kotaro Tsurusaki of Koshi City (JP)
Keiji Onzuka of Koshi City (JP)
Yoshihiro Kai of Koshi City (JP)
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
This abstract first appeared for US patent application 18958534 titled 'SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
Original Abstract Submitted
A substrate processing system includes: a loading/unloading part into/from which a cassette that accommodates a plurality of substrates is loaded/unloaded; a batch-type processing part configured to collectively process a lot including the plurality of substrates; a single-substrate-type processing part configured to the plurality of substrates of the lot one by one; and an interface part configured to deliver the plurality of substrates between the batch-type processing part and the single-substrate-type processing part, wherein the loading/unloading part, the single-substrate-type processing part, the interface part, and the batch-type processing part are arranged in this order, and wherein the interface part comprises a lot formation part configured to form the lot, and a transfer part configured to transfer the plurality of substrates from the single-substrate-type processing part to the lot formation part, and configured to transfer the plurality of substrates from the batch-type processing part to the single-substrate-type processing part.