18942941. GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY (Applied Materials, Inc.)
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
Organization Name
Inventor(s)
Chi-Ming Tsai of San Jose CA (US)
Chun-chih Chuang of Changhua (TW)
Yung Peng Hu of Miaoli County 363 (TW)
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
This abstract first appeared for US patent application 18942941 titled 'GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
Original Abstract Submitted
Embodiments of the present disclosure generally relate to lithography systems. More particularly, embodiments of the present disclosure relate to a method, a system, and a software application for a lithography process to control transmittance rate of write beams and write gray tone patterns in a single exposure operation. In one embodiment, a plurality of shots are provided by an image projection system in a lithography system to a photoresist layer. The plurality of shots exposes the photoresist layer to an intensity of light emitted from the image projection system. The local transmittance rate of the plurality of shots within an exposure area is varied to form varying step heights in the exposure area of the photoresist layer.