18937082. SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Nobutaka Sasaki of Miyagi (JP)
Gyeong min Park of Miyagi (JP)
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
This abstract first appeared for US patent application 18937082 titled 'SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
Original Abstract Submitted
A substrate support includes a base, a support portion, a first pin member, a second pin member and a driving unit. The base has a first surface on which an object to be supported is placed, a second surface opposite to the first surface, and a first through-hole. The support portion has a third surface in contact with the second surface, a fourth surface opposite to the third surface, and a second through-hole. The first pin member is stored in the first through-hole and a second pin member is stored in the second through-hole. The first through-hole is larger on the second surface side than on the first surface side, and/or the second through-hole is larger on the third surface side than on the fourth surface side.