18920078. SUBSTRATE-PROCESSING METHOD (Tokyo Electron Limited)
SUBSTRATE-PROCESSING METHOD
Organization Name
Inventor(s)
Yoshinori Morisada of Yamanashi JP
SUBSTRATE-PROCESSING METHOD
This abstract first appeared for US patent application 18920078 titled 'SUBSTRATE-PROCESSING METHOD
Original Abstract Submitted
A substrate-processing method includes a) forming a flowable oligomer on a substrate, the flowable oligomer containing carbon; and b) exposing the substrate to a plasma of a modification gas containing carbon and hydrogen, thereby modifying the flowable oligomer and forming a carbon-containing film.