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18919048. SINGLE WAFER ORIENTATION TOOL-INDUCED SHIFT CLEANING (KLA Corporation)

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SINGLE WAFER ORIENTATION TOOL-INDUCED SHIFT CLEANING

Organization Name

KLA Corporation

Inventor(s)

Amnon Manassen of Haifa IL

Peter Paquet of Ann Arbor MI US

Yingpin Wu of Taipei TW

Fang-Jyun Yeh of Tainan City TW

Suryanarayanan Ganesan of San Ramon CA US

Jordan Pio of Hillsboro OR US

Shankar Krishnan of Santa Clara CA US

Taher Kagalwala of Fremont CA US

Derrick A. Shaughnessy of San Jose CA US

Yan Zhang of Fremont CA US

Stilian Pandev of Santa Clara CA US

Min-Yeong Moon of Ann Arbor MI US

SINGLE WAFER ORIENTATION TOOL-INDUCED SHIFT CLEANING

This abstract first appeared for US patent application 18919048 titled 'SINGLE WAFER ORIENTATION TOOL-INDUCED SHIFT CLEANING

Original Abstract Submitted

A metrology system may include a spectroscopic metrology sub-system and a controller, the controller including one or more processors configured to execute program instructions configured to cause the one or more processors to: generate a tool-induced shift (TIS) model of a training sample by the metrology sub-system comprising: receiving training data from metrology measurements of the training sample, the training data comprising spectral data associated with at least one off-diagonal Mueller matrix element generated by one or more first measurements of the training sample at a first azimuthal angle and one or more second measurements of the training sample at a second azimuthal angle, deriving overlay spectra data and TIS spectra data from the training data, decomposing the overlay spectra data and the TIS spectra data, and inferring a TIS signature for the training sample; and to remove the TIS signature from a test sample.

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