18918378. POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS (Shin-Etsu Chemical Co., Ltd.)
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi JP
Masahiro Fukushima of Joetsu-shi JP
Tatsuya Yamahira of Joetsu-shi JP
Masaki Ohashi of Joetsu-shi JP
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
This abstract first appeared for US patent application 18918378 titled 'POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Original Abstract Submitted
A positive resist composition is provided comprising a base polymer comprising repeat units (a) having a substituted or unsubstituted carboxy group and a substituted or unsubstituted phenolic hydroxy group, repeat units (b) having an acid labile group, and repeat units (c) consisting of a sulfonic acid anion bonded to the polymer backbone and a sulfonium or iodonium cation. It exhibits a high sensitivity and resolution and forms a pattern of satisfactory profile with reduced edge roughness or dimensional variation.