18911171. Substrate Processing Apparatus (TOKYO ELECTRON LIMITED)

Substrate Processing Apparatus

Organization Name

TOKYO ELECTRON LIMITED

Inventor(s)

Naoki Kubota of Tokyo JP

Hiroshi Sone of Tokyo JP

Substrate Processing Apparatus

This abstract first appeared for US patent application 18911171 titled 'Substrate Processing Apparatus

Original Abstract Submitted

A substrate processing apparatus comprises a processing chamber having a ceiling and a cathode part installed at the ceiling and configured to sputter a target. The ceiling has an engagement portion around the target. The cathode part includes a first shield member having an attachment portion to be attached to the engagement portion and a conductive seal member configured to electrically connect the ceiling and the first shield member.