18910437. RESIST COMPOSITION AND PATTERN FORMING PROCESS (Shin-Etsu Chemical Co., Ltd.)
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi JP
Masahiro Fukushima of Joetsu-shi JP
RESIST COMPOSITION AND PATTERN FORMING PROCESS
This abstract first appeared for US patent application 18910437 titled 'RESIST COMPOSITION AND PATTERN FORMING PROCESS
Original Abstract Submitted
A resist composition comprising a base polymer possessing a sulfonium or iodonium salt structure having an iodized arylsulfonic acid anion attached to its backbone is provided. It exhibits a high sensitivity and forms a pattern with reduced LWR or improved CDU independent of whether it is of positive or negative type.