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18898926. GaN CRYSTAL AND GaN WAFER (Mitsubishi Chemical Corporation)

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GaN CRYSTAL AND GaN WAFER

Organization Name

Mitsubishi Chemical Corporation

Inventor(s)

Yusuke Tsukada of Tokyo JP

Takayuki Ishinabe of Tokyo JP

Yutaka Tsujii of Tokyo JP

Tatsuya Takahashi of Tokyo JP

Hirotaka Ikeda of Tokyo JP

GaN CRYSTAL AND GaN WAFER

This abstract first appeared for US patent application 18898926 titled 'GaN CRYSTAL AND GaN WAFER

Original Abstract Submitted

A GaN crystal with an angle between the normal line of a main surface and an m-axis of 0 degrees or more and 20 degrees or less is provided, in which the GaN crystal having, on the main surface thereof, a band-shaped dislocation-concentrated region that satisfies at least one requirement selected from the group consisting of (1) to (3) and a GaN wafer with a narrow width of the band-shaped dislocation-concentrated region present on the main surface and contribution to an improvement in the yield of a nitride semiconductor device:

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