18895486. SEI MESSAGE FOR FILM GRAIN SYNTHESIS MASK (TENCENT AMERICA LLC)
SEI MESSAGE FOR FILM GRAIN SYNTHESIS MASK
Organization Name
Inventor(s)
Stephan Wenger of Hillsborough CA US
Arianne Hinds of Palo Alto CA US
SEI MESSAGE FOR FILM GRAIN SYNTHESIS MASK
This abstract first appeared for US patent application 18895486 titled 'SEI MESSAGE FOR FILM GRAIN SYNTHESIS MASK
Original Abstract Submitted
A method and apparatus comprising computer code configured to cause a processor or processors to obtain video data including at least one coded picture; reconstruct a coded picture associated in the video data with a film grain characteristics SEI message, a first sample, a second sample, a third alpha map sample, and a fourth alpha map sample, wherein after reconstruction the first sample and the third alpha map sample, and the second sample and fourth sample are spatially co-located; apply film grain synthesis to the first sample based on a first value of the third sample; and determine to not apply film grain syntheses to the second sample based on a second value of the fourth sample, wherein the first value and second value are different from each other.