18891961. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited)
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APPARATUS FOR PLASMA PROCESSING
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Inventor(s)
Merritt Funk of Austin TX (US)
APPARATUS FOR PLASMA PROCESSING
This abstract first appeared for US patent application 18891961 titled 'APPARATUS FOR PLASMA PROCESSING
Original Abstract Submitted
An apparatus for plasma processing includes a first resonating structure and a second resonating structure. The first resonating structure is coupled to a first RF generator through a first matching circuit. The second resonating structure surrounds the first resonating structure. The second resonating structure is coupled to a second RF generator through a second matching circuit.