18882666. SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD (Kioxia Corporation)
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
Organization Name
Inventor(s)
Ryusuke Kon of Yokkaichi Mie (JP)
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
This abstract first appeared for US patent application 18882666 titled 'SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
Original Abstract Submitted
According to an embodiment, a semiconductor device includes a lamination film of a plurality of first insulating films and a plurality of electrode layers alternately laminated on each other in a first direction. A plurality of contact plugs extend in the first direction. Each electrode layer in the lamination film contacts one of the contact plugs in a stair step region of the lamination film. Each contact plug contacts an uppermost electrode layer in a stair step portion of the stair step region. A center portion of a lower end of each contact plug has a concave shape.