18835838. Ion Milling Device, and Inspection System (HITACHI HIGH-TECH CORPORATION)
Ion Milling Device, and Inspection System
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Ion Milling Device, and Inspection System
This abstract first appeared for US patent application 18835838 titled 'Ion Milling Device, and Inspection System
Original Abstract Submitted
An ion milling device includes: a first monitoring mechanism that measures an amount of sputtered particles generated by irradiating a sample with an ion beam; and a second monitoring mechanism that images a processed surface of the sample formed by irradiating the sample with the ion beam, in which processing on the sample ends when a sputtering amount of the sample estimated through measurement by the first monitoring mechanism and a shape of the processed surface image extracted from a picture captured by the second monitoring mechanism satisfy processing end conditions set for the sputtering amount and the shape of the processed surface.