18835612. PHOTORESIST COMPOSITION (POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION)
PHOTORESIST COMPOSITION
Organization Name
POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
Inventor(s)
Chan-Cuk Hwang of Pohang-si KR
PHOTORESIST COMPOSITION
This abstract first appeared for US patent application 18835612 titled 'PHOTORESIST COMPOSITION
Original Abstract Submitted
The present disclosure relates to a photoresist composition including a tin-oxo cluster, an oxidizing agent, and a polar organic solvent in which when irradiated with ultraviolet, bonds constituting the cluster are broken to form cross-linking between the clusters