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18834129. SUBSTRATE PROCESSING APPARATUS (TOKYO ELECTRON LIMITED)

From WikiPatents

SUBSTRATE PROCESSING APPARATUS

Organization Name

TOKYO ELECTRON LIMITED

Inventor(s)

Motoi Yamagata of Tokyo JP

Hiroshi Sone of Tokyo JP

Masato Shinada of Tokyo JP

Yusuke Kikuchi of Yamanashi JP

SUBSTRATE PROCESSING APPARATUS

This abstract first appeared for US patent application 18834129 titled 'SUBSTRATE PROCESSING APPARATUS

Original Abstract Submitted

Provided is a substrate processing apparatus that has an improved cooling performance. This substrate processing apparatus comprises: a placing table which is provided in a processing container and on which a substrate is to be placed; a refrigerator that has a contacting surface that makes contact with or is separated from a contact target surface of the placing table, and cools the placing table; and a lifting/lowering device that lifts or lowers the refrigerator and generates a pressing force for pressing the refrigerator against the placing table.

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