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18830121. SEMICONDUCTOR DEVICES, MICROELECTROMECHANICAL SYSTEM GAS SENSOR, METHODS (Infineon Technologies AG)

From WikiPatents

SEMICONDUCTOR DEVICES, MICROELECTROMECHANICAL SYSTEM GAS SENSOR, METHODS

Organization Name

Infineon Technologies AG

Inventor(s)

Michael Hauff of München DE

David Tumpold of Kirchheim beim München DE

Tobias Mittereder of München DE

Mohammadamir Ghaderi of Regensburg DE

Stefan Hampl of Dresden DE

Alfred Sigl of Sinzing DE

Sebastian Schwagerl of Cham DE

SEMICONDUCTOR DEVICES, MICROELECTROMECHANICAL SYSTEM GAS SENSOR, METHODS

This abstract first appeared for US patent application 18830121 titled 'SEMICONDUCTOR DEVICES, MICROELECTROMECHANICAL SYSTEM GAS SENSOR, METHODS

Original Abstract Submitted

In accordance with an embodiment, a semiconductor device includes: a radiator comprising a radiation layer configured to radiate an electromagnetic wave; a detector comprising a detection layer configured to detect the electromagnetic wave; a substrate; and an interface layer arranged between the radiator or the detector and the substrate, where a thermal conductivity of the radiator or the detector is different from a thermal conductivity of the interface layer.

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