18820061. REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR (AGC Inc.)

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR

Organization Name

AGC Inc.

Inventor(s)

Takeshi Okato of Tokyo (JP)

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR

This abstract first appeared for US patent application 18820061 titled 'REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR

Original Abstract Submitted

A reflective mask blank, which is a binary reflective mask blank, includes, in order: a substrate; a multilayer reflective film configured to reflect EUV light; and a pattern film. The pattern film has a laminated structure including a total of L layers each having a different refractive index where L is a natural number of 2 or more. When an absorption coefficient of an i-th layer in the pattern film from a side opposite to the substrate is defined as k, a thickness of the i-th layer in the pattern film from the side opposite to the substrate is defined as d(nm), a total thickness of the pattern film is defined as d, an exposure wavelength is defined as λ (nm), and Pis defined as −exp(−π/λ*dk), the following formula (1) is satisfied.