18804605. SEMICONDUCTOR DEVICES INCLUDING BIT LINES (SAMSUNG ELECTRONICS CO., LTD.)
SEMICONDUCTOR DEVICES INCLUDING BIT LINES
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SEMICONDUCTOR DEVICES INCLUDING BIT LINES
This abstract first appeared for US patent application 18804605 titled 'SEMICONDUCTOR DEVICES INCLUDING BIT LINES
Original Abstract Submitted
A semiconductor device may include a substrate including a first active region defined by a first device isolation layer, a bit line contact arranged on the first active region of the substrate, and a bit line that extends in a first direction on the substrate. The bit line includes a lower conductive layer arranged on the substrate and on a sidewall of the bit line contact and a metal line stack arranged on the lower conductive layer. The metal line stack includes a first conductive layer arranged on the lower conductive layer and the bit line contact and including a first metal material, a first intermediate layer arranged on the first conductive layer and including graphene, and a second conductive layer arranged on the first intermediate layer and including the first metal material.