18778898. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD (SEMES CO., LTD.)
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Organization Name
Inventor(s)
Young Jun Son of Cheonan-si KR
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
This abstract first appeared for US patent application 18778898 titled 'SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Original Abstract Submitted
Provided are a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a substrate support portion supporting a substrate, a first discharge unit including a first nozzle discharging a first processing liquid to the substrate, a first measurement unit connected to the first nozzle and measuring a first amount of charges of the first processing liquid discharged from the first nozzle, a bowl disposed around the substrate support portion, a second measurement unit measuring a second amount of charges of the first processing liquid scattered from the substrate to the surface of the bowl, and a second discharge unit including a second nozzle discharging a second processing liquid charged based on a difference between the first amount of charges and the second amount of charges to the substrate.
