18754488. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
PLASMA PROCESSING APPARATUS
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PLASMA PROCESSING APPARATUS
This abstract first appeared for US patent application 18754488 titled 'PLASMA PROCESSING APPARATUS
Original Abstract Submitted
A plasma processing apparatus includes: a chamber including a processing space inside the chamber; a substrate support installed in the processing space; an excitation electrode installed above the substrate support; a discharger configured to discharge electromagnetic waves into a plasma generation space below the excitation electrode; and a resonator installed on the excitation electrode and electromagnetically coupled to the discharger. The resonator includes a waveguide path including a plurality of folded portions between a first end and a second end of the resonator. At least one adjustor configured to adjust a resonance frequency of the electromagnetic waves propagating in the waveguide path is installed in the waveguide path.