18738621. SEMICONDUCTOR DEVICE (Samsung Electronics Co., Ltd.)
SEMICONDUCTOR DEVICE
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SEMICONDUCTOR DEVICE
This abstract first appeared for US patent application 18738621 titled 'SEMICONDUCTOR DEVICE
Original Abstract Submitted
A semiconductor device incudes: a plurality of lower channel patterns apart from each other; a plurality of upper channel patterns spaced apart from each other on the plurality of lower channel patterns; a gate structure surrounding the plurality of lower channel patterns and the plurality of upper channel patterns; a lower source/drain trench positioned on at least one side of the plurality of lower channel patterns; an upper source/drain trench positioned on at least one side of the plurality of upper channel patterns; a lower source/drain pattern positioned within the lower source/drain trench; and an upper source/drain pattern including first upper source/drain layers positioned on opposite sidewalls of the upper source/drain trench, and a second upper source/drain layer positioned between the first upper source/drain layers, in which the first upper source/drain layer does not cover at least a portion of the bottom surface of the upper source/drain trench.