18732570. POLISHING APPARATUS AND POLISHING METHOD (EBARA CORPORATION)
POLISHING APPARATUS AND POLISHING METHOD
Organization Name
Inventor(s)
SAURABH Kulkarni of Tokyo (JP)
POLISHING APPARATUS AND POLISHING METHOD
This abstract first appeared for US patent application 18732570 titled 'POLISHING APPARATUS AND POLISHING METHOD
Original Abstract Submitted
The disclosure provides a polishing apparatus capable of removing a polishing liquid or polishing debris from a light passing portion of a polishing pad. A polishing apparatus includes a polishing table supporting a polishing pad that has a light passing portion ; a polishing head pressing a substrate W against a polishing surface of the polishing pad ; an optical sensor disposed in the polishing table , irradiating light to the substrate W through the light passing portion , and receiving reflected light from the substrate W through the light passing portion ; and a cleaning portion forming a cleaning space CS that covers the light passing portion above the light passing portion and supplying a cleaning fluid to the light passing portion through the cleaning space CS.