SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING SEMICONDUCTOR DEVICE

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SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING SEMICONDUCTOR DEVICE

This abstract first appeared for US patent application 18732268 titled 'SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING SEMICONDUCTOR DEVICE

Original Abstract Submitted

A semiconductor device includes: a substrate; a gate stacking structure that includes interlayer insulating layers and gate electrodes that are alternately stacked on the substrate; a channel structure that penetrates the gate stacking structure and extends in a first direction, and includes a channel layer connected to the substrate and a ferroelectric layer that surrounds the channel layer; a charge inflow pattern disposed on a lateral side of the ferroelectric layer and spaced apart in the first direction; and an insulation pattern disposed between the charge inflow pattern and the gate electrodes and that surrounds an exterior side, a lower side, and an upper side of the charge inflow pattern.