18690979. METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES (ASML Netherlands B.V.)
METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES
Organization Name
Inventor(s)
Marie-Claire Van Lare of Veldhoven NL
Wilhelmus Patrick Elisabeth Maria Op T Root of Nederweert NL
METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES
This abstract first appeared for US patent application 18690979 titled 'METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES
Original Abstract Submitted
Disclosed is a method for determining a focus parameter from a target on a substrate. The target comprises an isofocal first sub-target and a second non-isofocal sub-target. The method comprises obtaining a first measurement signal relating to measurement of the first sub-target, a second measurement signal relating to measurement of the second sub-target and at least one trained relationship and/or model which relates at least said second measurement signal to said focus parameter. A value for said focus parameter is determined from said first measurement signal, second measurement signal and said at least one trained relationship and/or model.